PVD Coating Materials / Sputtering Targets
Nickel Chromium Alloy Target
Specifications
| Product Name | Nickel Chromium Alloy Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Ni-Cr |
| Purity | 99.9%~99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
Nickel-chromium alloy targets are mainly used to deposit high-precision stable thin-film resistors for thin-film circuits, sensor heating elements, and voltage-divider resistors. They are also used for display-panel electrostatic protection and electromagnetic shielding coatings. Additional applications include optical attenuation films, photothermal absorbing coatings, corrosion-resistant decorative hardware films, and MEMS strain-sensing resistor layers.
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