PVD Coating Materials / Sputtering Targets
Chromium Metal Target
金属铬靶
Specifications
| Product Name | Chromium Metal Target |
|---|---|
| Chinese Name | 金属铬靶 |
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Cr |
| Purity | ≥99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | 真空包装 |
| Customization | 是 |
Product Features
圆形，方形，可绑定
원형, 정사각형, 바인딩 가능
Applications
广泛用于五金装饰镀膜、光学镜片硬膜、刀具耐磨打底层、光伏电池缓冲膜，兼具高附着力、遮光、耐磨特性。
Widely used for decorative hardware coatings, hard coatings on optical lenses, wear-resistant underlayers for cutting tools, and photovoltaic cell buffer films, offering strong adhesion, light blocking, and wear resistance.
장식용 하드웨어 코팅, 광학 렌즈의 하드 코팅, 절삭 공구용 내마모성 하층 및 광전지 완충 필름에 널리 사용되며 강력한 접착력, 차광성 및 내마모성을 제공합니다.
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