PVD Coating Materials / Sputtering Targets
Yttrium Metal Target
Specifications
| Product Name | Yttrium Metal Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Y |
| Purity | Y/TREM:99.9%~99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm; Tube Target OD < 300mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
Used for semiconductor chip high-k gate dielectrics and ferroelectric memory media, diffusion barrier and buffer layers, chamber protective coatings, YBCO high-temperature superconducting buffer layers, display panel coatings, co-sputtered YSZ electrolyte films, high-refractive-index Y2O3 films formed by oxidizing high-purity yttrium, high-temperature thermal-barrier underlayers, and corrosion-resistant barrier films.
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