PVD Coating Materials / Sputtering Targets
Lanthanum Metal Target
Specifications
| Product Name | Lanthanum Metal Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | La |
| Purity | La/TREM:99.5%~99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity lanthanum sputtering targets are mainly used for semiconductor high-k gate dielectrics, IGZO display backplane dopant layers, and OLED flexible encapsulation barrier films, supporting stable production of advanced chips and high-end panels. They can also be used for infrared optical coatings, fuel-cell perovskite films, scintillation detection layers, photovoltaics, RF devices, and thin-film materials research.
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