PVD Coating Materials / Sputtering Targets
Holmium Metal Target
Specifications
| Product Name | Holmium Metal Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Ho |
| Purity | Ho/TREM:99.9%~99.95% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm; Tube Target OD < 300mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity holmium sputtering targets are mainly used for 2 micrometer eye-safe laser gain films, medical and radar laser gain films, semiconductor high-k dielectrics, and IGZO display backplane dopant layers for optoelectronics, advanced storage, and high-end panel manufacturing. They can also be deposited as infrared optical coatings, neutron detection shielding layers, and fuel-cell electrolyte films, supporting research in magnetic refrigeration, superconducting heterojunctions, and quantum sensing.
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