PVD Coating Materials / Sputtering Targets
Hafnium Metal Target
Specifications
| Product Name | Hafnium Metal Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Hf |
| Purity | Hf+Zr≥99.95% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity hafnium sputtering targets are mainly used for advanced semiconductor high-k gate dielectrics, ferroelectric memory films, and IGZO display backplane dopant layers, serving 5-28 nm chips and high-end OLED panel production. They can also be used for infrared laser optical coatings, perovskite photovoltaic passivation films, high-temperature aerospace protective layers, neutron shielding, RF power devices, and advanced thin-film materials research.
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