PVD Coating Materials / Sputtering Targets
Aluminum Metal Target
Specifications
| Product Name | Aluminum Metal Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Al |
| Purity | 99.99%~99.999% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm; Tube Target OD < 300mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity aluminum sputtering targets are widely used for TFT metal wiring in display panels and OLED pixel reflective electrodes, and are key consumables for aluminum interconnects and wafer-bonding aluminum pads in mature semiconductor processes. They are also used for thin-film photovoltaic back reflectors, decorative mirror coatings, electromagnetic shielding, and Low-E energy-saving glass optical films. Aluminum targets can be co-sputtered with scandium targets to prepare ScAlN piezoelectric films.
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