PVD Coating Materials / Sputtering Targets
Aluminium Yttrium Alloy Target
Specifications
| Product Name | Aluminium Yttrium Alloy Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Al-Y |
| Purity | 99.9%~99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
Yttrium-aluminum alloy targets with suitable compositions can be sputtered to form YAG films, mainly for high-end OLED and foldable-screen IGZO backplane doping and flexible TFE barrier films. They are also used as semiconductor high-k dielectric and diffusion-barrier layers for high-generation panels and advanced chip manufacturing. Additional applications include aerospace engine thermal-barrier coatings, nuclear corrosion-resistant protective films, fuel-cell electrolytes, and infrared laser optical films for new-energy, special-equipment, and advanced-material research.
RFQ Checklist