PVD Coating Materials / Sputtering Targets
Aluminium Scandium Alloy Target
Specifications
| Product Name | Aluminium Scandium Alloy Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Al-Sc |
| Purity | 99.9%~99.99% |
| Standard Size | Round Target Dia < 350mm; Rectangular Target Width < 240mm; Rectangular Target Length < 550mm |
| Packaging | Vacuum packaging |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity aluminum-scandium alloy sputtering targets are mainly used to prepare 5G/6G RF AlScN piezoelectric films by reactive sputtering, serving as key consumables for mobile-phone and base-station BAW filters. They are also used as IGZO display backplane dopant layers and ferroelectric memory film materials. Additional uses include buffer layers for semiconductor power devices, photovoltaic passivation films, and high-temperature aerospace protective coatings for RF communications, advanced storage, high-end displays, and new-energy thin-film research.
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