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PVD Coating Materials / Sputtering Targets

Aluminium Neodymium Alloy Target

Aluminium Neodymium Alloy Target product image

Specifications

Product NameAluminium Neodymium Alloy Target
Product LinePVD Coating Materials
CategorySputtering Targets
Formula / CompositionAl-Nd
Purity99.9%~99.99%
Standard SizeLong side < 2200mm
PackagingProtective film
CustomizationYes

Product Features

Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.

Applications

High-purity aluminum-neodymium alloy targets are mainly used for TFT metal wiring in display panels and OLED reflective electrodes, helping solve hillock defects in pure aluminum films at high temperature. They are also used as aluminum interconnects and wafer pad conductive layers in mature semiconductor processes to improve long-term panel and chip reliability. The material can also be deposited for MRAM magnetic storage films, photovoltaic back electrodes, infrared optical reflective films, and automotive magnetic sensor coatings, covering flexible electronics, third-generation semiconductors, and magnetic-material research.

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