PVD Coating Materials / Sputtering Targets
Aluminium Neodymium Alloy Target
Specifications
| Product Name | Aluminium Neodymium Alloy Target |
|---|---|
| Product Line | PVD Coating Materials |
| Category | Sputtering Targets |
| Formula / Composition | Al-Nd |
| Purity | 99.9%~99.99% |
| Standard Size | Long side < 2200mm |
| Packaging | Protective film |
| Customization | Yes |
Product Features
Prepared from high-purity feedstock under controlled processing for stable and uniform thin-film deposition.
Applications
High-purity aluminum-neodymium alloy targets are mainly used for TFT metal wiring in display panels and OLED reflective electrodes, helping solve hillock defects in pure aluminum films at high temperature. They are also used as aluminum interconnects and wafer pad conductive layers in mature semiconductor processes to improve long-term panel and chip reliability. The material can also be deposited for MRAM magnetic storage films, photovoltaic back electrodes, infrared optical reflective films, and automotive magnetic sensor coatings, covering flexible electronics, third-generation semiconductors, and magnetic-material research.
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